![Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment | Journal of Materials Research | Cambridge Core Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment | Journal of Materials Research | Cambridge Core](https://static.cambridge.org/content/id/urn%3Acambridge.org%3Aid%3Aarticle%3AS0884291411004286/resource/name/S0884291411004286_figAb.jpeg?pub-status=live)
Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment | Journal of Materials Research | Cambridge Core
Characterization of silicon oxynitride films deposited by a high-power impulse magnetron sputtering deposition technique
![Effects of processing force on performance of nano-resonators produced by magnetron sputtering deposition - ScienceDirect Effects of processing force on performance of nano-resonators produced by magnetron sputtering deposition - ScienceDirect](https://ars.els-cdn.com/content/image/1-s2.0-S1386947718306507-gr1.jpg)
Effects of processing force on performance of nano-resonators produced by magnetron sputtering deposition - ScienceDirect
![Tutorial: Hysteresis during the reactive magnetron sputtering process: Journal of Applied Physics: Vol 124, No 24 Tutorial: Hysteresis during the reactive magnetron sputtering process: Journal of Applied Physics: Vol 124, No 24](https://aip.scitation.org/action/showOpenGraphArticleImage?doi=10.1063/1.5042084&id=images/medium/1.5042084.figures.online.highlight_f1.jpg)